Minimizing linewidth roughness in Step and Flash Imprint Lithography

Microelectronic Engineering

Volumn 85, Issue 5-6, 2008, Pages 856-860

  Khusnatdinov, Niyaz ^a   Schmid, Gerard M ^a   Brooks, Cynthia B ^a   LaBrake, Dwayne ^a   Resnick, Douglas J ^a   Hart, Mark W ^b   Gopalakrishnan, Kailash ^b   Shenoy, Rohit ^b   Jih, Ron ^b   Zhang, Ying ^c   Sikorski, Edmund ^c   Rothwell, Mary Beth ^c   Owens, Jordan ^d   Ford, Arnie ^d  

^a MOLECULAR IMPRINTS INC   (United States)

^b IBM ALMADEN RESEARCH CENTER   (United States)

^c IBM T J WATSON RESEARCH CENTER   (United States)

^d SEMATECH   (United States)

Author keywords

Imprint lithography; Linewidth roughness; Replication; S FIL; Template

Indexed keywords

FEATURE EXTRACTION; IMAGE ACQUISITION; OPTICAL RESOLVING POWER; SCANNING ELECTRON MICROSCOPY;

FEATURE ROUGHNESS; FLASH IMPRINT LITHOGRAPHY; LINEWIDTH ROUGHNESS (LWR);

PHOTOLITHOGRAPHY;

EID: 44149105427     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2008.01.041     Document Type: Article

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