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Surface and Coatings Technology

Volumn 194, Issue 2-3, 2005, Pages 265-270

TEM study on chromium nitride coatings deposited by reactive sputter method

(4) Era, H a Ide, Y b Nino, A a Kishitake, K a

a KYUSHU INSTITUTE OF TECHNOLOGY (Japan)

b Yamaguchi Prefectural Industrial Technology Institute (Japan)

Author keywords

Chromium nitride; Grain growth; Lattice parameters; Magnetron; Phase transitions; Transmission electron microscopy

Indexed keywords

CHROMIUM COMPOUNDS; COMPOSITION; CRYSTAL STRUCTURE; LATTICE CONSTANTS; SPUTTER DEPOSITION; STAINLESS STEEL; STOICHIOMETRY; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

CHROMIUM NITRIDE COATINGS; COARSE STRUCTURE; NITROGEN CONTENT; REACTIVE SPUTTER METHOD;

CHROMATE COATINGS;

CHROMIUM NITRIDE;

EID: 13844256203 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2004.05.022 Document Type: Article

Times cited : (27)

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