Effect of 690-keV Xe ion irradiation on the microstructure of amorphous MoSi2/SiC nanolayer composites

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 127-128, Issue , 1997, Pages 648-650

  Lu, Y C ^a   Kung, H ^a   Jervis, T R ^a   Hirvonen, J P ^b   Ruck D ^c   Mitchell, T E ^a   Nastasi, M ^a  

^a LOS ALAMOS NATIONAL LABORATORY   (United States)

^b JOINT RESEARCH CENTRE   (Italy)

^c GSI HELMHOLTZZENTRUM FÜR SCHWERIONENFORSCHUNG GMBH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ANNEALING; CRYSTAL MICROSTRUCTURE; ELECTRON DIFFRACTION; ION BOMBARDMENT; MOLYBDENUM COMPOUNDS; MULTILAYERS; NANOSTRUCTURED MATERIALS; RADIATION DAMAGE; SILICON CARBIDE; TRANSMISSION ELECTRON MICROSCOPY; XENON;

DIFFRACTION RINGS; NANOLAYER COMPOSITES;

CERAMIC MATRIX COMPOSITES;

EID: 0031547640     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(96)01145-7     Document Type: Article

References (6)

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3. J.J. Petrovic, MRS Bull. XVIII (July 1993) 35.
4. H. Kung, T.R. Jervis, J.-P. Hirvonen, T.E. Mitchell, J.D. Embury and M.A. Nastasi, Philos. Mag. A71 (1995) 759.
5. H.J. Goldschmidt, Interstitial Alloys (Butterworth, Sussex, 1967).
6. M. Nastasi, J.W. Mayer and J.K. Hirvonen, Ion-solid Interactions - Fundamentals and Applications (Cambridge University Press, Cambridge, 1996).