Surface oxidation of vanadium dioxide films prepared by radio frequency magnetron sputtering

Chinese Physics B

Volumn 17, Issue 9, 2008, Pages 3512-3515

  Wang, Xue Jin ^a   Liang, Chun Jun ^b   Guan, Kang Ping ^b   Li, De Hua ^c   Nie, Yu Xin ^c   Zhu, Shi Oiu ^a   Huang, Feng ^a   Zhang, Wei Wei ^a   Cheng, Zheng Wei ^b  

^a CHINA AGRICULTURAL UNIVERSITY   (China)

^b BEIJING JIAOTONG UNIVERSITY   (China)

^c INSTITUTE OF PHYSICS   (China)

Author keywords

Films; Magnetron sputtering; Surface oxidation; Vanadium dioxide

Indexed keywords

CHEMICAL OXYGEN DEMAND; ELECTROMAGNETIC WAVES; MAGNETRONS; METAL IONS; OXIDATION; PHOTOELECTRON SPECTROSCOPY; RADIO; RADIO WAVES; SUBSTRATES; SURFACE DIFFUSION; TRANSITION METALS; VANADIUM; VANADIUM ALLOYS; X RAY PHOTOELECTRON SPECTROSCOPY;

NON STOICHIOMETRIES; RADIO FREQUENCIES; RAMAN MODES; SODIUM IONS; SUBSTRATE TEMPERATURES; SURFACE OXIDATION; SURFACE OXIDATIONS; TRANSPARENT SUBSTRATES; VANADIUM DIOXIDE; VANADIUM DIOXIDE FILMS; X-RAY DIFFRACTIONS; X-RAY PHOTOELECTRON SPECTROSCOPIES;

MAGNETRON SPUTTERING;

EID: 56349116341     PISSN: 16741056     EISSN: None     Source Type: Journal    
DOI: 10.1088/1674-1056/17/9/062     Document Type: Article

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