Fabrication of vanadium dioxide films at low temperature and researches on properties of the films

Wuli Xuebao/Acta Physica Sinica

Volumn 55, Issue 6, 2006, Pages 2846-2851

  Wang, Li Xia ^a   Li, Jian Ping ^a   He, Xiu Li ^a   Gao, Xiao Guang ^a  

^a INSTITUTE OF ELECTRONICS   (China)

Author keywords

Oxygen partial pressure; Radio frequency reactive sputtering; Temperature coefficients of resistivity; Vanadium dioxide

Indexed keywords

EID: 33745309427     PISSN: 10003290     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (17)