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Applied Physics Letters

Volumn 93, Issue 19, 2008, Pages

Low power density multihole cathode very-high-frequency plasma for mixed phase Si:H thin films

(8) Jariwala, C a Chainani, A a,b Eguchi, R b,c Matsunami, M b,c Shin, S b,c Bhatt, S a Dalal, V d John, P I a

a INSTITUTE FOR PLASMA RESEARCH (India)

b RIKEN HARIMA INSTITUTE (Japan)

c UNIVERSITY OF TOKYO (Japan)

d Iowa State University (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS SILICON; MICROCRYSTALLINE SILICON; PLASMAS; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SILICON SOLAR CELLS; TELLURIUM COMPOUNDS; THICK FILMS; THIN FILMS;

ATOMIC FORCES; CAPACITIVELY COUPLED; COLLISIONAL PLASMAS; H MATRIXES; HIGH FREQUENCIES; HIGH RESOLUTIONS; ION DENSITIES; LANGMUIR PROBE MEASUREMENTS; LOW POWERS; LOW TEMPERATURES; OHMIC PLASMAS; RADIAL PROFILES; SI:H THIN FILMS; SUBSTRATE TEMPERATURES; TWO TYPES; VHF PLASMAS;

PLASMA DEPOSITION;

EID: 56249089657 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.3023066 Document Type: Article

Times cited : (3)

References (26)

1
- 0003730831
- (Wiley, New York).
- M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing (Wiley, New York, 1994).
- (1994) Principles of Plasma Discharges and Materials Processing
- Lieberman, M.A.¹ Lichtenberg, A.J.²

2
- 0023421273
- 0272-4324 10.1007/BF01016517.
- H. Curtins, N. Wyrsch, M. Favre, and A. Shah, Plasma Chem. Plasma Process. 0272-4324 10.1007/BF01016517 7, 267 (1987).
- (1987) Plasma Chem. Plasma Process. , vol.7 , pp. 267
- Curtins, H.¹ Wyrsch, N.² Favre, M.³ Shah, A.⁴

3
- 0002252601
- 0022-3093
- M. Kondo, M. Fukawa, L. H. Guo, and A. Matsuda, J. Non-Cryst. Solids 266, 484 (2000). 0022-3093
- (2000) J. Non-Cryst. Solids , vol.266 , pp. 484
- Kondo, M.¹ Fukawa, M.² Guo, L.H.³ Matsuda, A.⁴

4
- 2442491050
- 0021-8979 10.1063/1.1690488.
- A. Salabas, L. Marques, J. Jolly, G. Gousset, and L. L. Alves, J. Appl. Phys. 0021-8979 10.1063/1.1690488 95, 4605 (2004).
- (2004) J. Appl. Phys. , vol.95 , pp. 4605
- Salabas, A.¹ Marques, L.² Jolly, J.³ Gousset, G.⁴ Alves, L.L.⁵

5
- 17544362798
- 0021-8979 10.1063/1.1866477.
- E. Amanatides, A. Hammad, E. Katsia, and D. Mataras, J. Appl. Phys. 0021-8979 10.1063/1.1866477 97, 073303 (2005).
- (2005) J. Appl. Phys. , vol.97 , pp. 073303
- Amanatides, E.¹ Hammad, A.² Katsia, E.³ Mataras, D.⁴

6
- 0041684089
- 0734-2101 10.1116/1.572805.
- M. R. Wertheimer and M. Moisan, J. Vac. Sci. Technol. A 0734-2101 10.1116/1.572805 3, 2643 (1985).
- (1985) J. Vac. Sci. Technol. A , vol.3 , pp. 2643
- Wertheimer, M.R.¹ Moisan, M.²

7
- 10044248759
- 0038-092X 10.1016/j.solener.2004.08.026.
- J. Meier, U. Kroll, E. Vallat-Sauvain, J. Spitznagel, U. Graf, and A. Shah, Sol. Energy 0038-092X 10.1016/j.solener.2004.08.026 77, 983 (2004).
- (2004) Sol. Energy , vol.77 , pp. 983
- Meier, J.¹ Kroll, U.² Vallat-Sauvain, E.³ Spitznagel, J.⁴ Graf, U.⁵ Shah, A.⁶

8
- 4644228690
- 0003-6951 10.1063/1.1784550.
- V. K. Dalal, J. Graves, and J. Leib, Appl. Phys. Lett. 0003-6951 10.1063/1.1784550 85, 1413 (2004).
- (2004) Appl. Phys. Lett. , vol.85 , pp. 1413
- Dalal, V.K.¹ Graves, J.² Leib, J.³

9
- 2342568977
- 0040-6090 10.1016/j.tsf.2003.12.041, ();, Appl. Phys. Lett. 0003-6951 10.1063/1.2837536 92, 033506 (2008).
- C. Niikura, N. Itagaki, M. Kondo, Y. Kawai, and A. Matsuda, Thin Solid Films 0040-6090 10.1016/j.tsf.2003.12.041 457, 84 (2004); A. H. M. Smets, T. Matsui, and M. Kondo, Appl. Phys. Lett. 0003-6951 10.1063/1.2837536 92, 033506 (2008).
- (2004) Thin Solid Films , vol.457 , pp. 84
- Niikura, C.¹ Itagaki, N.² Kondo, M.³ Kawai, Y.⁴ Matsuda, A.⁵ Smets, A.H.M.⁶ Matsui, T.⁷ Kondo, M.⁸

10
- 0001650492
- 0003-6951 10.1063/1.124992.
- J. Koh, A. S. Ferlauto, P. I. Rovira, C. R. Wronski, and R. W. Collins, Appl. Phys. Lett. 0003-6951 10.1063/1.124992 75, 2286 (1999).
- (1999) Appl. Phys. Lett. , vol.75 , pp. 2286
- Koh, J.¹ Ferlauto, A.S.² Rovira, P.I.³ Wronski, C.R.⁴ Collins, R.W.⁵

11
- 0032608065
- 0003-6951 10.1063/1.123693.
- S. Guha, J. Yang, D. L. Williamson, Y. Lubianiker, J. D. Cohen, and A. H. Mahan, Appl. Phys. Lett. 0003-6951 10.1063/1.123693 74, 1860 (1999).
- (1999) Appl. Phys. Lett. , vol.74 , pp. 1860
- Guha, S.¹ Yang, J.² Williamson, D.L.³ Lubianiker, Y.⁴ Cohen, J.D.⁵ Mahan, A.H.⁶

12
- 0033879621
- 0927-0248 10.1016/S0927-0248(99)00140-3.
- O. Vetterl, F. Finger, R. Carius, P. Hapke, L. Houben, O. Kluth, A. Lambertz, A. Muck, B. Rech, and H. Wagner, Sol. Energy Mater. Sol. Cells 0927-0248 10.1016/S0927-0248(99)00140-3 62, 97 (2000).
- (2000) Sol. Energy Mater. Sol. Cells , vol.62 , pp. 97
- Vetterl, O.¹ Finger, F.² Carius, R.³ Hapke, P.⁴ Houben, L.⁵ Kluth, O.⁶ Lambertz, A.⁷ Muck, A.⁸ Rech, B.⁹ Wagner, H.¹⁰

13
- 0000899218
- 0003-6951 10.1063/1.119418.
- D. L. Staebler and C. R. Wronski, Appl. Phys. Lett. 0003-6951 10.1063/1.119418 71, 1846 (1977).
- (1977) Appl. Phys. Lett. , vol.71 , pp. 1846
- Staebler, D.L.¹ Wronski, C.R.²

14
- 0002111842
- 0022-3093 10.1016/S0022-3093(99)00713-9.
- G. N. Parsons, J. Non-Cryst. Solids 0022-3093 10.1016/S0022-3093(99) 00713-9 266, 23 (2000).
- (2000) J. Non-Cryst. Solids , vol.266 , pp. 23
- Parsons, G.N.¹

15
- 36248941884
- 0021-8979 10.1063/1.2809345.
- S. Nunomura and M. Kondo, J. Appl. Phys. 0021-8979 10.1063/1.2809345 102, 093306 (2007).
- (2007) J. Appl. Phys. , vol.102 , pp. 093306
- Nunomura, S.¹ Kondo, M.²

16
- 0025839087
- 0042-207X 10.1016/0042-207X(91)90022-B.
- P. A. Chatterton, J. A. Rees, W. L. Ku, and K. Al-Assadi, Vacuum 0042-207X 10.1016/0042-207X(91)90022-B 42, 489 (1991).
- (1991) Vacuum , vol.42 , pp. 489
- Chatterton, P.A.¹ Rees, J.A.² Ku, W.L.³ Al-Assadi, K.⁴

17
- 0001541167
- 0021-8979 10.1063/1.1661573.
- R. R. J. Gagne and A. Cantin, J. Appl. Phys. 0021-8979 10.1063/1.1661573 43, 2639 (1972).
- (1972) J. Appl. Phys. , vol.43 , pp. 2639
- Gagne, R.R.J.¹ Cantin, A.²

18
- 10044257657
- 0038-092X 10.1016/j.solener.2004.06.007.
- H. Takatsuka, M. Noda, Y. Yonekura, Y. Takeuchi, and Y. Yamauchi, Sol. Energy 0038-092X 10.1016/j.solener.2004.06.007 77, 951 (2004).
- (2004) Sol. Energy , vol.77 , pp. 951
- Takatsuka, H.¹ Noda, M.² Yonekura, Y.³ Takeuchi, Y.⁴ Yamauchi, Y.⁵

19
- 0001435610
- 0021-8979 10.1063/1.345109.
- A. P. Paranjpe, J. P. Mcvittie, and S. A. Self, J. Appl. Phys. 0021-8979 10.1063/1.345109 67, 6718 (1990).
- (1990) J. Appl. Phys. , vol.67 , pp. 6718
- Paranjpe, A.P.¹ McVittie, J.P.² Self, S.A.³

20
- 0343479572
- 0963-0252 10.1088/0963-0252/3/2/006.
- I. D. Sudit and F. F. Chen Plasma Sources Sci. Technol. 0963-0252 10.1088/0963-0252/3/2/006 3, 162 (1994).
- (1994) Plasma Sources Sci. Technol. , vol.3 , pp. 162
- Sudit, I.D.¹ Chen, F.F.²

21
- 4043105192
- 0021-8979 10.1063/1.340989.
- M. J. Kushner, J. Appl. Phys. 0021-8979 10.1063/1.340989 63, 2532 (1988).
- (1988) J. Appl. Phys. , vol.63 , pp. 2532
- Kushner, M.J.¹

22
- 0037155450
- Y. Kurimoto, T. Shimizu, S. Iizuka, M. Suemitsu, and N. Sato, Thin Solid Films 407, 7 (2002).
- (2002) Thin Solid Films , vol.407 , pp. 7
- Kurimoto, Y.¹ Shimizu, T.² Iizuka, S.³ Suemitsu, M.⁴ Sato, N.⁵

23
- 36449004174
- 0003-6951 10.1063/1.106112.
- M. Surendra and D. B. Graves, Appl. Phys. Lett. 0003-6951 10.1063/1.106112 59, 2091 (1991).
- (1991) Appl. Phys. Lett. , vol.59 , pp. 2091
- Surendra, M.¹ Graves, D.B.²

24
- 0004342572
- Y. Takeuchi, I. Kawasaki, H. Mashima, M. Murata, and Y. Kawai, Thin Solid Films
- Thin Solid Films
- Takeuchi, Y.¹ Kawasaki, I.² Mashima, H.³ Murata, M.⁴ Kawai, Y.⁵

25
- 33748494669
- 0003-6951 10.1063/1.2244101.
- P. C. P. Bronsveld, J. K. Rath, R. E. I. Schropp, T. Mates, A. Fejfar, B. Rezek, and J. Kocka, Appl. Phys. Lett. 0003-6951 10.1063/1.2244101 89, 051922 (2006).
- (2006) Appl. Phys. Lett. , vol.89 , pp. 051922
- Bronsveld, P.C.P.¹ Rath, J.K.² Schropp, R.E.I.³ Mates, T.⁴ Fejfar, A.⁵ Rezek, B.⁶ Kocka, J.⁷

26
- 0346482214
- E. Bohmer and H. Luth, J. Non-Cryst. Solids 266, 1038 (2000).
- (2000) J. Non-Cryst. Solids , vol.266 , pp. 1038
- Bohmer, E.¹ Luth, H.²

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