Effects of electron temperature on the quality of a-Si:H and μ

Thin Solid Films

Volumn 407, Issue 1-2, 2002, Pages 7-11

  Kurimoto, Yuji ^a   Shimizu, Tetsuji ^b   Iizuka, Satoru ^b   Suemitsu, Maki ^a   Sato, Noriyoshi ^b  

^a TOHOKU UNIVERSITY   (Japan)

^b NONE

Author keywords

Chemical vapour deposition (CVD); Electron temperature control; Plasma processing and deposition; Silicon thin film

Indexed keywords

AMORPHOUS SILICON; CRYSTALLIZATION; ELECTRIC CONDUCTIVITY; ELECTRONS; ION BOMBARDMENT; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THERMAL EFFECTS;

ELECTRON TEMPERATURE;

THIN FILMS;

EID: 0037155450     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00004-4     Document Type: Conference Paper

References (10)