Excimer laser ablation removal of thin chromium films from glass substrates

Surface and Coatings Technology

Volumn 113, Issue 1-2, 1999, Pages 63-74

  Lee, S K ^a   Yoon, K K ^a   Whang, K H ^a   Na, S J ^b  

^a Korea Institute of Machine and Materials   (South Korea)

^b Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

Chromium film; Excimer laser; Optimal condition; Patterning; Removal mechanism

Indexed keywords

CHROMIUM; EXCIMER LASERS; GLASS; MATHEMATICAL MODELS; MELTING; METALLIC FILMS; REMOVAL; SUBSTRATES; THIN FILMS; VAPORIZATION;

FILM REMOVAL; VAPOR RECOIL PRESSURE;

LASER ABLATION;

EID: 0032625361     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(98)00824-X     Document Type: Article

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