Columnar growth of ultra-thin nanocrystalline Si films on quartz by Low Pressure Chemical Vapor Deposition: Accurate control of vertical size

Physica Status Solidi (A) Applications and Materials Science

Volumn 205, Issue 11, 2008, Pages 2615-2620

  Lioutas, Ch B ^a   Vouroutzis, N ^a   Tsiaoussis, I ^a   Frangis, N ^a   Gardelis, S ^b   Nassiopoulou, A G ^b  

^a ARISTOTLE UNIVERSITY OF THESSALONIKI   (Greece)

^b INSTITUTE OF NANOSCIENCE AND NANOTECHNOLOGY   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

ACCURATE CONTROLS; COLUMNAR GROWTHS; INITIAL STAGES; LATERAL DISTRIBUTIONS; LATERAL SIZES; NANOCRYSTAL ARRAYS; NANOCRYSTAL SIZES; NANOCRYSTALLINE SI FILMS; NANOCRYSTALLINE SILICON FILMS; THICKNESS OF THE FILMS; VARYING THICKNESSES; VERTICAL SIZES;

LOW PRESSURE CHEMICAL VAPOR DEPOSITION; MAGNETIC FILMS; MICROSCOPIC EXAMINATION; MOLECULAR BEAM EPITAXY; NANOCRYSTALLINE ALLOYS; NANOCRYSTALLINE MATERIALS; NANOCRYSTALLINE SILICON; NANOCRYSTALS; NANOSTRUCTURED MATERIALS; NANOSTRUCTURES; OXIDE MINERALS; QUARTZ; SEMICONDUCTING SILICON; SILICON; VAPORS;

FILM GROWTH;

EID: 55849083925     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.200880224     Document Type: Conference Paper

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