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Volumn 27, Issue 5, 2005, Pages 745-749

Optical gain in different silicon nanocrystal systems

(10) Fauchet, P M a Ruan, J a Chen, H a Pavesi, L b Dal Negro, L b,d Cazzaneli, M b Elliman, R G c Smith, N c Samoc, M c Luther Davies, B c

a University of Rochester (United States)

b UNIVERSITY OF TRENTO (Italy)

c AUSTRALIAN NATIONAL UNIVERSITY (Australia)

d Massachusetts Institute of Technology Cambridge (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; ATTENUATION; FURNACES; HIGH PRESSURE EFFECTS; ION IMPLANTATION; LIGHT ABSORPTION; MONOCHROMATORS; NANOSTRUCTURED MATERIALS; OXIDATION; PHOTOMULTIPLIERS; PHOTONS;

NANOCRYSTAL DENSITY; PUMP FLUENCE; SILICON NANOCRYSTALLINE SUPERLATTICES; VARIABLE STRIPE LENGTH (VSL);

SILICON ON INSULATOR TECHNOLOGY;

EID: 13444271979 PISSN: 09253467 EISSN: None Source Type: Journal
DOI: 10.1016/j.optmat.2004.08.008 Document Type: Conference Paper

Times cited : (83)

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