Effect of the gas mixture composition on high-temperature behavior of magnetron sputtered Si-B-C-N coatings

Surface and Coatings Technology

Volumn 203, Issue 5-7, 2008, Pages 466-469

  Capek J ^a   Hreben S ^a   Zeman, P ^a   Vlcek J ^a   Cerstvy R ^a   Houska J ^a  

^a UNIVERSITY OF WEST BOHEMIA   (Czech Republic)

Author keywords

High temperature oxidation resistance; High temperature stability; Magnetron co sputtering; Si B C N coatings

Indexed keywords

AMORPHOUS SILICON; ARGON; CHEMICAL OXYGEN DEMAND; COATINGS; CONCENTRATION (PROCESS); DIFFERENTIAL SCANNING CALORIMETRY; GAS FUEL ANALYSIS; GAS MIXTURES; GASES; HELIUM; INORGANIC COATINGS; LASER INTERFEROMETRY; MAGNETRON SPUTTERING; MAGNETRONS; METALLIC GLASS; MIXTURES; MOSFET DEVICES; OXIDATION; OXIDATION RESISTANCE; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON; SPUTTER DEPOSITION; THERMODYNAMIC STABILITY; X RAY DIFFRACTION ANALYSIS;

AMORPHOUS SI; AMORPHOUS STRUCTURES; ARGON GAS MIXTURES; CONCENTRATION RATIOS; DC MAGNETRONS; ELASTIC RECOIL DETECTION ANALYSIS; HIGH RESOLUTIONS; HIGH TEMPERATURES; HIGH THERMAL STABILITIES; HIGH-TEMPERATURE OXIDATION RESISTANCE; HIGH-TEMPERATURE STABILITY; MIXTURE COMPOSITIONS; N COATINGS; NEGATIVE SUBSTRATE BIASES; RUTHERFORD BACKSCATTERING SPECTROMETRIES; SI-B-C-N COATINGS; SUBSTRATE TEMPERATURES; TARGET EROSIONS; THERMAL STABILITIES; THERMOGRAVIMETRY; TOTAL PRESSURES; X-RAY DIFFRACTIONS;

INERT GASES;

EID: 55749096905     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2008.07.025     Document Type: Article

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