Effect of implanted argon on hardness of novel magnetron sputtered Si-B-C-N materials: Experiments and ab initio simulations

Journal of Physics Condensed Matter

Volumn 19, Issue 19, 2007, Pages

  Houska J ^a   Kalas J ^a   Vlcek J ^a   Bilek, M M M ^b   McKenzie, D R ^b  

^a UNIVERSITY OF WEST BOHEMIA   (Czech Republic)

^b UNIVERSITY OF SYDNEY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; COMPUTER SIMULATION; GAS MIXTURES; HARDNESS; MAGNETRON SPUTTERING; MOLECULAR DYNAMICS; NITROGEN; SILICON;

MOLECULARDYNAMICS SIMULATIONS; REACTIVE MAGNETRON SPUTTERING; TEMPERATURE DEPENDENCE;

AMORPHOUS ALLOYS;

EID: 34248681832     PISSN: 09538984     EISSN: 1361648X     Source Type: Journal    
DOI: 10.1088/0953-8984/19/19/196228     Document Type: Article

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