Magnetron sputtered Si-B-C-N films with high oxidation resistance and thermal stability in air at temperatures above 1500°C

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 26, Issue 5, 2008, Pages 1101-1108

  Vlček, Jaroslav ^a   Hřeben, Stanislav ^a   Kalaš, Jiří ^a   Čapek, Jiří ^a   Zeman, Petr ^a   Čerstvý, Radomír ^a   Peřina, Vratislav ^b   Setsuhara, Yuichi ^c  

^a UNIVERSITY OF WEST BOHEMIA   (Czech Republic)

^b NUCLEAR PHYSICS INSTITUTE   (Czech Republic)

^c OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ANNEALING; ARGON; CHEMICAL ANALYSIS; CHEMICAL OXYGEN DEMAND; CHLORINE COMPOUNDS; DEPOSITION; FORMING; GAS MIXTURES; GRAVIMETRIC ANALYSIS; HIGH RESOLUTION ELECTRON MICROSCOPY; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; HYDROGEN; INERT GASES; MAGNETRON SPUTTERING; MAGNETRONS; METALLIC FILMS; MICROSCOPIC EXAMINATION; OXIDATION; OXIDATION RESISTANCE; OXYGEN; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON; SILICON CARBIDE; SUBSTRATES; TARGETS; THERMOGRAVIMETRIC ANALYSIS;

C-N FILMS;

AMORPHOUS SILICON;

EID: 50849137147     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2949232     Document Type: Article

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