Electron-beam controlled radio frequency discharges for plasma processing

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 4, 1996, Pages 2094-2101

  Kushner, Mark J ^a   Collison, Wenli Z ^a,b   Ruzic, David N ^a  

^a University of Illinois at Urbana Champaign   (United States)

^b LAM RESEARCH CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0030518237     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580086     Document Type: Article

References (16)

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14. W. Z. Collison and M. J. Kushner, Appl. Phys. Lett, (submitted).
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16. Cross sections for these processes were obtained from V. McKoy (private communication, 1995).