Effects of humidity and solution age on growth of organosilane self-assembled monolayers

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 47, Issue 8 PART 1, 2008, Pages 6416-6421

  Lee, Sunhyung ^a   Ishizaki, Takahiro ^b   Saito, Nagahiro ^c   Takai, Osamu ^c  

^a SHINSHU UNIVERSITY   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^c NAGOYA UNIVERSITY   (Japan)

Author keywords

Atomic force microscope; Grazing incidence X ray diffraction; Humidity and solution age; Self assembled monolayer; Self organization

Indexed keywords

ATOMIC PHYSICS; ATOMIC SPECTROSCOPY; ATOMS; CRYSTALLINE MATERIALS; DIFFRACTION; ELECTRON ENERGY LEVELS; FOURIER TRANSFORMS; METEOROLOGY; MISSILE BASES; MOISTURE; MONOLAYERS; ORGANIC POLYMERS; RANGE FINDING; RATE CONSTANTS; REACTION RATES; SILANES; SILICON COMPOUNDS; X RAY ANALYSIS; X RAY DIFFRACTION;

ATOMIC FORCE MICROSCOPE; GRAZING INCIDENCE X-RAY DIFFRACTION; HUMIDITY AND SOLUTION AGE; SELF-ASSEMBLED MONOLAYER; SELF-ORGANIZATION;

SELF ASSEMBLED MONOLAYERS;

EID: 55149103334     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.47.6416     Document Type: Article

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