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Volumn 47, Issue 6 PART 2, 2008, Pages 5042-5047
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Fabrication of nanostencil by size reduction of microaperture by additional deposition
a
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Author keywords
Clogging; Nanolithography; Nanopattern; Nanostencil; Shadow mask
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Indexed keywords
ALUMINA;
COMPOSITE MICROMECHANICS;
DEPOSITION;
ELECTROMECHANICAL DEVICES;
FABRICATION;
MEMS;
MICROELECTROMECHANICAL DEVICES;
NANOLITHOGRAPHY;
PLASMA DEPOSITION;
SILICON COMPOUNDS;
SIZE DETERMINATION;
THICKNESS MEASUREMENT;
VAPORS;
A-PLANE;
BEAM EVAPORATIONS;
BOTTOM SURFACES;
CLOGGING;
CROSS SECTIONS;
DEPOSITION METHODS;
GREAT-ER;
MICROELECTROMECHANICAL SYSTEMS PROCESSES;
MICROMETER SCALES;
NANOPATTERN;
NANOSCALE;
NANOSTENCIL;
NANOSTENCILS;
SHADOW MASK;
SIZE-REDUCTION;
TAPER SHAPES;
TEST RESULTS;
TOP SURFACES;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
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EID: 55049133194
PISSN: 00214922
EISSN: 13474065
Source Type: Journal
DOI: 10.1143/JJAP.47.5042 Document Type: Article |
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Times cited : (2)
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References (7)
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