Formation of the porous structure of silicon dioxide thin layers during silane oxidation

Chemical Vapor Deposition

Volumn 14, Issue 1-2, 2008, Pages 51-56

  Dultsev, Fedor N ^a  

^a RUSSIAN ACADEMY OF SCIENCES   (Russian Federation)

Author keywords

CVD processes; Ellipsometric porosimetry; Porous structure; Silicon dioxide

Indexed keywords

AMMONIA; CHEMICAL OXYGEN DEMAND; NONMETALS; OXIDATION; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POROSITY; PROPYLENE; SILANES; SILICA;

CHEMICAL NATURES; CVD PROCESSES; ELLIPSOMETRIC POROSIMETRY; EXPERIMENTAL DATUM; FILM POROSITIES; HIGH POROSITIES; LOW PRESSURES; MODELING; MODELING RESULTS; POROUS STRUCTURE; POROUS STRUCTURES; SILICON DIOXIDE; SILICON DIOXIDE FILMS; SILICON DIOXIDES; SOLID SILICONS; THIN LAYERS; UNIFORM PORES;

POROUS SILICON;

EID: 54949131359     PISSN: 09481907     EISSN: 15213862     Source Type: Journal    
DOI: 10.1002/cvde.200706663     Document Type: Article

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