Testing asymmetry in plasma-ball growth seeded by a nanoscale absorbing defect embedded in a SiO2 thin-film matrix subjected to UV pulsed-laser radiation

Journal of Applied Physics

Volumn 104, Issue 6, 2008, Pages

  Papernov, S ^a   Schmid, A W ^a  

^a UNIVERSITY OF ROCHESTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 54749124051     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2980054     Document Type: Article

References (17)

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