Mechanism initiated by nanoabsorber for UV nanosecond-pulse-driven damage of dielectric coatings

Optics Express

Volumn 16, Issue 5, 2008, Pages 3376-3382

  Wei, Chaoyang ^a   Shao, Jianda ^a   He, Hongbo ^a   Yi, Kui ^a   Fan, Zhengxiu ^a  

^a SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC PROPERTIES; ENERGY GAP; PLASMA INTERACTIONS; PULSED LASER APPLICATIONS; SILICON COMPOUNDS; ULTRASHORT PULSES; ULTRAVIOLET RADIATION;

DIELECTRIC COATINGS; NANOABSORBERS; NANOSECOND PULSED LASER INTERACTIONS; OPTICAL DAMAGE; PLASMA FORMATION; TEMPERATURE DEPENDENCE;

THIN FILMS;

NANOMATERIAL; SILICON DIOXIDE;

ARTICLE; CHEMICAL MODEL; CHEMISTRY; COMPUTER SIMULATION; RADIATION EXPOSURE; SURFACE PROPERTY; ULTRASTRUCTURE; ULTRAVIOLET RADIATION;

COMPUTER SIMULATION; MODELS, CHEMICAL; NANOSTRUCTURES; SILICON DIOXIDE; SURFACE PROPERTIES; ULTRAVIOLET RAYS;

EID: 40349110977     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.16.003376     Document Type: Article

References (18)