Modeling the laser-induced diffusible resistance process

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5339, Issue , 2004, Pages 265-275

  Meunier, Michel ^a,b   Degorce, Jean Yves ^a   Gillet, Jean Numa ^a   Magny, François ^a  

^a ÉCOLE POLYTECHNIQUE DE MONTRÉAL   (Canada)

^b LTRIM Technologies Inc   (Canada)

Author keywords

Highly accurate resistance; Laser process modeling; Laser trimming; Laser tuned microdevices; Laser induced diffusible resistance; Microelectronics; Semiconductor modeling

Indexed keywords

COMPUTER SIMULATION; DIFFUSION; DOPING (ADDITIVES); FIELD EFFECT TRANSISTORS; ITERATIVE METHODS; SPECIFIC HEAT;

HIGHLY ACCURATE RESISTANCE; LASER PROCESS MODELING; LASER TRIMMING; LASER TUNED MICRODEVICES; LASER-INDUCED DIFFUSIBLE RESISTANCE; SEMICONDUCTOR MODELING;

LASER PULSES;

EID: 5444222667     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.525512     Document Type: Conference Paper

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