Laser induced local modification of silicon microdevices: A new technique for tuning analogue microelectronics

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5147, Issue , 2003, Pages 316-321

  Meunier, Michel ^a,b   Ducharme, Mathieu ^a   Degorce, Jean Yves ^a   Liao, Yougui ^a   Lacourse, Alain ^b  

^a ÉCOLE POLYTECHNIQUE DE MONTRÉAL   (Canada)

^b LTRIM Technologies Inc   (Canada)

Author keywords

Highly accurate resistance; Laser induced diffusible resistance; Laser trimming; Microelectronics

Indexed keywords

CARRIER MOBILITY; CHEMICAL MODIFICATION; CMOS INTEGRATED CIRCUITS; CURRENT VOLTAGE CHARACTERISTICS; DIFFUSION; FIELD EFFECT TRANSISTORS; LASER APPLICATIONS; SEMICONDUCTING SILICON; SEMICONDUCTOR DOPING; TRANSMISSION ELECTRON MICROSCOPY;

DOPANTS; HIGHLY ACCURATE RESISTANCE; LASER INDUCED DIFFUSIBLE RESISTANCE; LASER TRIMMING;

MICROELECTRONICS;

EID: 2342651548     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.543669     Document Type: Conference Paper

References (9)

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