Laser induced diffusible resistance: Device characterization and process modeling

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4637, Issue , 2002, Pages 75-81

  Meunier, M ^a   Cadotte, M ^a   Ducharme, M ^a   Gagnon, Y ^a   Lacourse, A ^a  

^a ÉCOLE POLYTECHNIQUE DE MONTRÉAL   (Canada)

Author keywords

Laser trimming; Microelectronics; Resistance

Indexed keywords

CARRIER MOBILITY; CHARACTERIZATION; CMOS INTEGRATED CIRCUITS; CURRENT VOLTAGE CHARACTERISTICS; DIFFUSION; ELECTRIC RESISTANCE; FIELD EFFECT TRANSISTORS; MATHEMATICAL MODELS; MICROELECTRONIC PROCESSING; PROCESS CONTROL; SEMICONDUCTOR DOPING; SEMICONDUCTOR JUNCTIONS;

LASER INDUCED DIFFUSION; LASER TRIMMING TECHNIQUES;

LASER BEAM EFFECTS;

EID: 0036405184     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.470672     Document Type: Conference Paper

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