Dopant redistribution and electrical activation in silicon following ultra-low energy boron implantation and excimer laser annealing

Physical Review B - Condensed Matter and Materials Physics

Volumn 67, Issue 7, 2003, Pages

  Whelan, S ^a   La Magna, A ^a   Privitera, V ^a   Mannino, G ^a   Italia, M ^a   Bongiorno, C ^a   Fortunato, G ^b   Mariucci, L ^b  

^a CNR IMM   (Italy)

^b IFN CNR   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

BORON; SILICON;

ARTICLE; CRYSTAL; ELECTRIC ACTIVITY; ELECTRIC RESISTANCE; ENERGY; EXCIMER LASER; IMPLANTATION; MASS SPECTROMETRY; TRANSMISSION ELECTRON MICROSCOPY;

EID: 0037441295     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.67.075201     Document Type: Article

References (17)

1. M A. Foad and D. Jennings, Semicond. Sci. Technol.41, 43 (1998).
2. A H. Al-Bayati, K G. Orrman-Rossiter, J A. van den Berg, and D G. Armour, Surf. Sci.241, 91 (1991).
3. P A. Stolk, H-J Gossmann, D J. Eaglesham, D C. Jacobson, C S. Rafferty, G H. Gilmer, M. Jaraíz, J M. Poate, H S. Luftman, and T E. Haynes, J. Appl. Phys.81, 6031 (1997).
4. R F. Wood, J R. Kirkpatrick, and G E. Giles, Phys. Rev. B23, 5555 (1981).
5. S. Whelan, V. Privitera, M. Italia, G. Mannino, C. Bongiorno, C. Spinella, G. Fortunato, L. Mariucci, M. Stanizzi, and A. Mittiga, J. Vac. Sci. Technol. B20, 644 (2002).
6. E. Rimini, in Surface Modification and Alloying by Laser, Ion and Electron Beams, edited by J. M. Poate, G. Foti, and D. Jacobsen (Plenum, New York, 1983), Chap. 2, p. 26.
7. V. Privitera, C. Spinella, G. Fortunato, and L. Mariucci, Appl. Phys. Lett.77, 552 (2000).
8. K. A. Jackson, in Surface Modification and Alloying by Laser, Ion and Electron Beams (Ref. 6), Chap. 3, p. 59.
9. A G. Cullis, H C. Webber, J M. Poate, and A L. Simons, Appl. Phys. Lett.36, 320 (1980).
10. B C. Larson, C W. White, and B R. Appleton, Appl. Phys. Lett.32, 801 (1978).
11. J. W. Cahn, S. R. Coriell, and W. J. Boettinger, in Laser and Electron Beam Processing of Materials, edited by C. W. White and P. S. Peercy (Academic, New York, 1980), p. 89.
12. V. Privitera, E. Schroer, F. Priolo, E. Napolitani, and A. Camera, J. Appl. Phys.88, 1299 (2000).
13. T. Clarysse, W. Vandervorst, and M. Pawlik, J. Vac. Sci. Technol. B14, 390 (1996).
14. J. F. Ziegler, Handbook of Ion Implantation Technology (North-Holland, Amsterdam, 1992).
15. G G. Bentini, M. Bianconi, and C. Summonte, Appl. Phys. A: Solids Surf.45, 317 (1988).
16. C. W. White, D. M. Zehner, S. U. Campisano and A. Cullis, in Surface Modification and Alloying by Laser, Ion and Electron Beams (Ref. 6), Chap. 4, p. 90.
17. M. Ghezzo and D M. Brown, J. Electrochem. Soc.120, 146 (1973).