Amorphous Sn - Ga - Zn - O channel thin-film transistors

Physica Status Solidi (A) Applications and Materials Science

Volumn 205, Issue 8, 2008, Pages 1920-1924

  Ogo, Youichi ^a   Nomura, Kenji ^a   Yanagi, Hiroshi ^a   Kamiya, Toshio ^a   Hirano, Masahiro ^a   Hosono, Hideo ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS; DEVICE PERFORMANCES; ON/OFF CURRENT RATIOS; OPTICAL MEASUREMENTS; SI WAFERS; TRANSPARENT AMORPHOUS OXIDE SEMICONDUCTORS (TAOS;

OPTICAL DATA PROCESSING; SEMICONDUCTING ORGANIC COMPOUNDS; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SILICON COMPOUNDS; SILICON WAFERS; THIN FILM DEVICES; TIN; TRANSISTORS; ZINC;

THIN FILM TRANSISTORS;

EID: 54249108024     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.200778908     Document Type: Conference Paper

References (17)

1. K. Nomura, H. Ohta, A. Takagi, T. Kamiya, M. Hirano, and H. Hosono, Nature (London) 432, 488 (2004).
2. K. Nomura, A. Takagi, T. Kamiya, H. Ohta, M. Hirano, and H. Hosono, Jpn. J. Appl. Phys. 45, 4303 (2006).
3. N. L. Dehuff, E. S. Kettenring, D. Hong, H. Q. Chiang, J. F. Wager, R. L. Hoffman, C.-H. Park, and D. A. Keszler, J. Appl. Phys. 97, 064505 (2005).
4. B. Yaglioglu, H. Y. Yeom, R. Beresford, and D. C. Paine, Appl. Phys. Lett. 89, 062103 (2006).
5. P. Barquinha, A. Pimentel, A. Marques, L. Pereira, R. Martins, and E. Fortunato, J. Non-Cryst. Solids 352, 1749 (2006).
6. H. Yabuta, M. Sano, K. Abe, T. Den, T. Aiba, H. Kumomi, K. Nomura, T. Kamiya, and H. Hosono, Appl. Phys. Lett. 89, 112123 (2006).
7. H. Kumomi, K. Nomura, T. Kamiya, and H. Hosono, Thin Solid Films 516, 1516 (2008).
8. A. Suresh, P. Wellenius, A. Dhawan, and J. Muth, Appl. Phys. Lett. 90, 123512 (2007).
9. H. Hosono, J. Non-Cryst. Solids 352, 851 (2006).
10. T. Minami, H. Sonohara, S. Takata, and H. Sato, Jpn. J. Appl. Phys. 33, L1693 (1994).
11. J. D. Perkins, J. A. del Cueto, J. L. Alleman, C. Warmsingh, B. M. Keyes, L. M. Gedvilas, P. A. Parilla, B. To, D. W. Readey, and D. S. Ginley, Thin Solid Films 411, 152 (2002).
12. H. Q. Chiang, J. F. Wager, R. L. Hoffman, J. Jeong, and D. A. Keszler, Appl. Phys. Lett. 86, 013503 (2005).
13. W. B. Jackson, R. L. Huffman, and G. S. Herman, Appl. Phys. Lett. 87, 193503 (2005).
14. P. Görrn, M. Sander, J. Meyer, M. Kröger, E. Becker, H.-H. Johannes, W. Kowalsky, and T. Riedl, Adv. Mater. 18, 738 (2006).
15. P. Görrn, P. Hölzer, T. Riedl, W. Kowalsky, J. Wang, T. Weimann, P. Hinze, and S. Kipp, Appl. Phys. Lett. 90, 063502 (2007).
16. Y. Hishikawa, N. Nakamura, S. Tsuda, S. Nakano, Y. Kishi, and Y. Kuwano, Jpn. J. Appl. Phys. 30, 1008 (1991).
17. G. B. Palmer and K. R. Poeppelmeier, Solid State Sci. 4, 317 (2002).