Rhodium and Rhodium Oxide Thin Films Characterized by XPS

Surface Science Spectra

Volumn 8, Issue 2, 2001, Pages 117-125

  Abe, Yoshio ^a   Kato, Kiyohiko ^a   Kawamura, Midori ^a   Sasaki, Katsutaka ^a  

^a KITAMI INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DYNAMIC RANDOM ACCESS STORAGE; FERROELECTRIC MATERIALS; FERROELECTRICITY; OXIDE FILMS; PLATINUM COMPOUNDS; RHODIUM COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

CAPACITOR ELECTRODE; DYNAMIC RANDOM ACCESS MEMORY; ELECTRODE MATERIAL; KΑ; METAL-OXIDE; MONOCHROMATICS; NONVOLATILE FERROELECTRIC RANDOM ACCESS MEMORY; PLATINUM GROUP METALS; THIN-FILMS; XPS SPECTRUM;

THIN FILMS;

EID: 23244462702     PISSN: 10555269     EISSN: 15208575     Source Type: Journal    
DOI: 10.1116/11.20010801     Document Type: Article

References (1)

1. K.Kato, Y.Abe, M.Kawamura, and K.Sasaki, Jpn. J. Appl. Phys. 40, 2399 (2001).