Plasma-controlled metal catalyst saturation and the initial stage of carbon nanostructure array growth

Journal of Applied Physics

Volumn 104, Issue 7, 2008, Pages

  Levchenko, I ^a   Ostrikov, K ^a,b   Mariotti, D ^c   Murphy, A B ^b  

^a UNIVERSITY OF SYDNEY   (Australia)

^b CSIRO   (Australia)

^c Rochester Institute of Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; CATALYSIS; CHEMICAL VAPOR DEPOSITION; EQUATIONS OF MOTION; GROWTH KINETICS; IONIZATION; NANOSTRUCTURED MATERIALS; NANOSTRUCTURES; NANOTUBES; NUCLEATION; PLASMAS; SEMICONDUCTING SILICON; SILICON; SURFACE DIFFUSION;

CARBON FLUXES; CARBON NANOSTRUCTURES; CATALYST PATTERNS; COMPLEX MODELS; DEGREE OF IONIZATIONS; DEPOSITION TIMES; HEIGHT DISTRIBUTIONS; HIGHLY IONIZED; INITIAL STAGES; ION MOTIONS; IONIZATION DEGREES; METAL CATALYSTS; NANOCONE ARRAYS; NANOSTRUCTURE ARRAYS; NANOTUBE ARRAYS; NI CATALYSTS; NUCLEATION AND GROWTHS; SILICON SURFACES; TEMPERATURE PLASMAS;

CARBON NANOTUBES;

EID: 54049121034     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2996272     Document Type: Article

References (33)

1. K. Bradley, J. C. P. Gabriel, A. Star, and G. Grüner, Appl. Phys. Lett. 0003-6951 10.1063/1.1619222 83, 3821 (2003).
2. K. Ostrikov, Rev. Mod. Phys. 0034-6861 10.1103/RevModPhys.77.489 77, 489 (2005).
3. Z. Chen, U. Cvelbar, M. Mozetic, J. He, and M. K. Sunkara, Chem. Mater. 0897-4756 10.1021/cm800288y 20, 3224 (2008); K. N. Ostrikov, S. Kumar, and H. Sugai, Phys. Plasmas 8, 3490 (2001).
4. M. Keidar, A. M. Waas, Y. Raitses, and E. Waldorff, J. Nanosci. Nanotechnol. 1533-4880 10.1166/jnn.2006.159 6, 1309 (2006).
5. C. Merino, P. Soto, E. Vilaplana-Ortego, J. M. Gomez de Salazar, F. Pico, and J. M. Rojo, Carbon 0008-6223 10.1016/j.carbon.2004.10.018 43, 551 (2005).
6. K. Ostrikov, J. D. Long, and P. P. Rutkevych, Vacuum 0042-207X 10.1016/j.vacuum.2006.01.025 80, 1126 (2006).
7. U. Cvelbar, K. Ostrikov, A. Drenik, and M. Mozetic, Appl. Phys. Lett. 0003-6951 10.1063/1.2905265 92, 133505 (2008).
8. K. Ostrikov and A. B. Murphy, J. Phys. D 0022-3727 10.1088/0022-3727/40/ 8/S01 40, 2223 (2007).
9. A. Okita, Y. Suda, A. Ozeki, H. Sugawara, Y. Sakai, A. Oda, and J. Nakamura, J. Appl. Phys. 0021-8979 10.1063/1.2150599 99, 014302 (2006).
10. L. R. Baylor, V. I. Merkulov, E. D. Ellis, M. A. Guillorn, D. H. Lowndes, A. V. Melechko, M. L. Simpson, and J. H. Whealton, J. Appl. Phys. 0021-8979 10.1063/1.1455138 91, 4602 (2002).
11. A. Drenik, U. Cvelbar, K. Ostrikov, and M. Mozetič, J. Phys. D 0022-3727 10.1088/0022-3727/41/11/115201 41, 115201 (2008).
12. I. Levchenko, K. Ostrikov, and E. Tam, Appl. Phys. Lett. 0003-6951 10.1063/1.2388941 89, 223108 (2006).
13. M. Mannsberger, A. Kukovecz, V. Georgakilas, J. Rechthaler, F. Hasi, G. Allmaier, M. Prato, and H. Kuzmany, Carbon 0008-6223 10.1016/j.carbon.2003.12. 049 42, 953 (2004).
14. I. Levchenko, K. Ostrikov, and A. Murphy, J. Phys. D 0022-3727 10.1088/0022-3727/41/9/092001 41, 092001 (2008).
15. I. Levchenko and K. Ostrikov, Appl. Phys. Lett. 0003-6951 10.1063/1.2841845 92, 063108 (2008).
16. I. Levchenko and K. Ostrikov, Nanotechnology 0957-4484 10.1088/0957-4484/19/33/335703 19, 335703 (2008); K. N. Ostrikov, S. Xu, and M. Y. Yu, J. Appl. Phys. 88, 2268 (2000).
17. F. J. Gordillo-Vazquez and J. Gonzalo, J. Appl. Phys. 0021-8979 10.1063/1.1628383 94, 7427 (2003).
18. U. Cvelbar and M. Mozetic, J. Phys. D 0022-3727 10.1088/0022-3727/40/8/ S09 40, 2300 (2007).
19. P. P. Rutkevych and S. Xu, Phys. Plasmas 1070-664X 10.1063/1.2102868 12, 103507 (2005).
20. V. Vahedi, G. DiPeso, C. K. Birdsall, M. A. Lieberman, and T. D. Rognlien, Plasma Sources Sci. Technol. 0963-0252 10.1088/0963-0252/2/4/006 2, 261 (1993).
21. I. B. Denysenko, S. Xu, J. D. Long, P. P. Rutkevych, and N. A. Azarenkov, J. Appl. Phys. 0021-8979 10.1063/1.1642762 95, 2713 (2004).
22. M. Keidar, I. Beilis, R. L. Boxman, and S. Goldsmith, J. Phys. D 0022-3727 10.1088/0022-3727/29/7/034 29, 1973 (1996).
23. M. Keidar and A. M. Waas, Nanotechnology 0957-4484 10.1088/0957-4484/15/ 11/034 15, 1571 (2004).
24. M. Keidar, J. Appl. Phys. 0021-8979 10.1063/1.2844495 103, 053309 (2008).
25. H. Rau and F. Picht, J. Phys. D 0022-3727 10.1088/0022-3727/26/8/016 26, 1260 (1993).
26. M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Material Processing (Wiley, New York, 1994).
27. I. Levchenko and K. Ostrikov, J. Phys. D 0022-3727 10.1088/0022-3727/40/ 8/S11 40, 2308 (2007).
28. I. Levchenko, K. Ostrikov, M. Keidar, and S. Xu, Appl. Phys. Lett. 0003-6951 10.1063/1.2222249 89, 033109 (2006); S. Y. Xu, J. D. Long, L. N. Sim, C. H. Diong, and K. Ostrikov, Plasma Processes Polym. 2, 373 (2005).
29. I. Levchenko and O. Baranov, Vacuum 0042-207X 10.1016/j.vacuum.2003.08. 004 72, 205 (2003).
30. I. Levchenko, A. E. Rider, and K. Ostrikov, Appl. Phys. Lett. 0003-6951 10.1063/1.2737428 90, 193110 (2007).
31. I. Levchenko, K. Ostrikov, and S. Xu, J. Appl. Phys. 0021-8979 10.1063/1.2040000 98, 064304 (2005).
32. I. Levchenko, K. Ostrikov, A. E. Rider, E. Tam, S. V. Vladimirov, and S. Xu, Phys. Plasmas 1070-664X 10.1063/1.2744353 14, 063502 (2007).
33. Z. Tsakadze, I. Levchenko, and K. Ostrikov, Carbon 0008-6223 10.1016/j.carbon.2007.05.030 45, 2022 (2007).