Real time surface morphology analysis of semiconductor materials and devices using 4D interference microscopy

Journal of Materials Science: Materials in Electronics

Volumn 19, Issue SUPPL. 1, 2008, Pages

  Montgomery, Paul ^a   Anstotz, Freddy ^a   Johnson, Gyasi ^a   Kiefer, Renaud ^b  

^a CNRS   (France)

^b INSA DE STRASBOURG   (France)

Author keywords

[No Author keywords available]

Indexed keywords

3-D IMAGING; 3-D MEASUREMENTS; AXIAL RESOLUTIONS; CMOS CAMERAS; DEPTH OF FIELD; DEVICE ANALYSIS; FRAME RATES; FRAME SIZE; HIGH SPEEDS; INTERFERENCE MICROSCOPY; NANOMETRIC; NEAR FIELDS; POST-PROCESSING; PROTOTYPE SYSTEMS; REAL TIME; REAL-TIME 3-D; SCANNING WHITE LIGHT INTERFEROMETRY; SURFACE MORPHOLOGY ANALYSIS;

CAMERAS; CHARGE COUPLED DEVICES; DIGITAL DEVICES; ELECTRIC CONDUCTIVITY; FIELD PROGRAMMABLE GATE ARRAYS (FPGA); IMAGE PROCESSING; PHOTOGRAPHY; SCANNING; SEMICONDUCTOR DEVICES; SPEED; SURFACE MORPHOLOGY; THREE DIMENSIONAL;

SEMICONDUCTOR MATERIALS;

EID: 53649101376     PISSN: 09574522     EISSN: 1573482X     Source Type: Journal    
DOI: 10.1007/s10854-007-9491-2     Document Type: Article

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