The metrology of a miniature FT spectrometer MOEMS device using white light scanning interference microscopy

Thin Solid Films

Volumn 450, Issue 1, 2004, Pages 79-83

  Montgomery, P C ^a   Montaner, D ^a   Manzardo, O ^b   Flury, M ^b   Herzig, H P ^b  

^a Faculté de Médecine   (France)

^b Applied Optics Laboratory   (Switzerland)

Author keywords

Interference microscopy; MOEMS; Silicon; Surface morphology

Indexed keywords

LIGHT INTERFERENCE; MICROOPTICS; MICROSCOPIC EXAMINATION; MORPHOLOGY; REACTIVE ION ETCHING; SEMICONDUCTING SILICON; SPECTROSCOPIC ANALYSIS;

INTERFERENCE MICROSCOPY; MICRO-OPTICAL ELECTRO-MECHANICAL SYSTEMS (MOEMS);

MICROELECTROMECHANICAL DEVICES;

EID: 1142279629     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.10.055     Document Type: Conference Paper

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