SCOPUS 정보 검색 플랫폼

Solar Energy

Volumn 82, Issue 11, 2008, Pages 1083-1087

Microcrystalline silicon grown by VHF PECVD and the fabrication of solar cells

(7) Chen, Yongsheng a,b Wang, Jianhua c Lu, Jingxiao b Zheng, Wen b Gu, Jinhua b Yang, Shi e b Gao, Xiaoyong b

a INSTITUTE OF PLASMA PHYSICS (China)

b ZHENGZHOU UNIVERSITY (China)

c WUHAN INSTITUTE OF TECHNOLOGY (China)

Author keywords

AFM; Microcrystalline silicon; Solar cells; VHF PECVD

Indexed keywords

GAS MIXTURES; HYDROGEN; MICROCRYSTALLINE SILICON; MICROSTRUCTURAL EVOLUTION; PHOTOVOLTAIC CELLS; PLASMA DEPOSITION; PLASMAS; SILANES; SILICON; SOLAR CELLS; SOLAR ENERGY; SOLAR EQUIPMENT;

AFM; CHAMBER PRESSURES; SUBSTRATE TEMPERATURE; VERY HIGH FREQUENCY PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; VHF PECVD;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

CRYSTALLINITY; FUEL CELL; MICROSTRUCTURE; OPTIMIZATION; SILICON; SOLAR POWER; SUBSTRATE;

EID: 53349177374 PISSN: 0038092X EISSN: None Source Type: Journal
DOI: 10.1016/j.solener.2008.01.007 Document Type: Article

Times cited : (20)

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