Direct measurements of the energy flux due to chemical reactions at the surface of a silicon sample interacting with a SF6 plasma

Applied Physics Letters

Volumn 93, Issue 13, 2008, Pages

  Dussart, R ^a   Thomann, A L ^a   Pichon, L E ^a   Bedra, L ^a   Semmar, N ^a   Lefaucheux, P ^a   Mathias, J ^a   Tessier, Y ^a  

^a UNIVERSITÉ D'ORLÉANS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTIONS; GRAFTING (CHEMICAL); SILICON; SYNTHESIS (CHEMICAL);

DIRECT MEASUREMENTS; ENERGY EXCHANGES; ENERGY FLUXES; SILICON SAMPLES; SILICON SURFACES;

SURFACE REACTIONS;

EID: 53349151566     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2995988     Document Type: Article

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