Ion beam mixing of Ni/Al multilayer structure at different temperatures

Vacuum

Volumn 61, Issue 2-4, 2001, Pages 291-296

  Zalar, A ^a   Jagielski, J ^b   Mozetic M ^a   Pracek B ^a   Panjan, P ^c  

^a Institute of Surface Engineering and Optoelectronics Ljubljana   (Slovenia)

^b ukasiewicz Research Network Institute of Microelectronics and Photonics   (Poland)

^c JO EF STEFAN INSTITUTE   (Slovenia)

Author keywords

AES; Diffusion; EXAFS; Ion beam mixing; Multilayer structures; Ni aluminides; XRD

Indexed keywords

ALUMINUM; ARGON; AUGER ELECTRON SPECTROSCOPY; DIFFUSION IN SOLIDS; HEAT TREATMENT; INTERFACES (MATERIALS); ION BEAMS; ION IMPLANTATION; METALLIC SUPERLATTICES; MIXING; MULTILAYERS; NICKEL; SPUTTER DEPOSITION; TEXTURES; THERMAL EFFECTS; X RAY DIFFRACTION ANALYSIS;

DEPTH PROFILING; NICKEL ALUMINIDE; X RAY ABSORPTION FINE STRUCTURE SPECTROSCOPY (EXAFS);

METALLIC FILMS;

EID: 0035858436     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(01)00131-2     Document Type: Conference Paper

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