Structure and reaction properties of thin Al films deposited on Ni(110)

Surface Science

Volumn 412-413, Issue , 1998, Pages 82-96

  Hahn, Peter ^a,c   Bertino, Massimo F ^a,d   Toennies, J Peter ^a   Ritter, Michael ^b   Weiss, Werner ^b  

^a MAX PLANCK INSTITUTE FOR DYNAMICS AND SELF ORGANIZATION   (Germany)

^b FRITZ HABER INSTITUT DER MAX PLANCK GESELLSCHAFT   (Germany)

^c FRAUNHOFER INSTITUTE FOR PHYSICAL MEASUREMENT TECHNIQUES IPM   (Germany)

^d MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

Aluminium; Catalysis; Chemisorption; Growth; Hydrogen; Low index single crystal surfaces; Nickel; Thermal desorption spectroscopy

Indexed keywords

ADSORPTION; ALUMINUM; CATALYSIS; CHEMISORPTION; COMPOSITION EFFECTS; CRYSTAL GROWTH; DESORPTION; DEUTERIUM; HYDROGEN; NICKEL; SINGLE CRYSTALS; THIN FILMS;

LOW INDEX SINGLE CRYSTALS; THERMAL DESORPTION SPECTROSCOPY; VOLMER-WEBER GROWTH;

METALLIC FILMS;

EID: 19244384158     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(98)00371-9     Document Type: Article

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