Gas-phase study of the reactivity of optical coating materials with hydrocarbons by use of a desktop-size extreme-ultraviolet laser

Journal of the Optical Society of America B: Optical Physics

Volumn 25, Issue 7, 2008, Pages

  Heinbuch, Scott ^a,b   Dong, Feng ^b   Rocca, Jorge J ^a,b   Bernstein, Elliot R ^b  

^a Engineering Research Center and Hydraulics Laboratory   (United States)

^b Department of Environmental and Radiological Health Sciences   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON LASERS; CARBON; EXTREME ULTRAVIOLET LITHOGRAPHY; GASES; HAFNIUM; HYDROCARBONS; IONIZATION OF GASES; MASS SPECTROMETRY; METALLIC COMPOUNDS; METALS; MIRRORS; NEON; OPTICAL COATINGS; PHOTOIONIZATION; TITANIUM; TITANIUM OXIDES; ULTRAVIOLET LASERS;

CAPPING LAYER; CARBON CONTAMINATION; COATING MATERIAL; EXTREME ULTRAVIOLET LASERS; EXTREME ULTRAVIOLETS; MASS SPECTROSCOPY; METAL-OXIDE CLUSTERS; MIRROR MATERIALS;

ZIRCONIUM;

EID: 51849159243     PISSN: 07403224     EISSN: None     Source Type: Journal    
DOI: 10.1364/JOSAB.25.000B85     Document Type: Conference Paper

References (27)

1. 2O oxidation of ruthemium optic coatings," J. Vac. Sci. Technol. B 24, 118-130 (2006).
2. B. Mertens, M. Weiss, H. Meiling, R. Klein, E. Louis, R. Kurt, M. Wedowski, H. Trenkler, B. Wo1schrijn, R. Jansen, A. Runstraat, R. Moors, K. Spee, S. Plöger, and R. Kruijs, "Progress in EUV optics lifetime expectations," Microelectron. Eng. 73-74, 16-22 (2004).
3. H. Meiling, B. Mertens, F. Stietz, M. Wedowski, R. Mein, R. Kurt, E. Loius, and A. Yakshin, "Prevention of MoSi multilayer reflection loss in EUVL tools," Proc. SPIE 4506, 93-104 (2001).
4. K. Boller, R.-P. Haelbich, H. Hogrefe, W. Jark, and C. Kunz, "Investigation of carbon contamination of mirror surfaces exposed to synchrotron radiation," Nucl. Instrum. Methods Phys. Res. 208, 273-279 (1983).
5. T. Engel, "The interaction of molecular and atomic oxygen with Si(100) and Si(111)," Surf. Sci. Rep. 18, 91-144 (1993).
6. G. Y. McDaniel, S. T. Fenstermaker, D. E. Walker, Jr., W. V. Lampert, S. M. Mukhopadhyay, and P. H. Holloway, "Electron-stimulated oxidation of silicon carbide," Surf. Sci. 445, 159-166 (2000).
7. T. Miyake, S. Soeki, H. Kato, A. Namiki, H. Kamba, and T. Suzaki, "Molecular-beam study of sticking of oxygen on Si(100)," Phys. Rev. B 42, 11801-11807 (1990).
8. R. A. Roseberg and D. C. Mancini, "Deposition of carbon on gold using synchrotron radiation," Nucl. Instrum. Methods Phys. Res. A 291, 101-106 (1990).
9. T. Koide, S. Sato, T. Shidara, M. Niwano, M. Yanagihara, A. Yamada, A. Fujimori, A. Mikuni, H. Kato, and T. Miyahara, "Investigation of carbon contamination of synchrotron radiation mirrors," Nucl. Instrum. Methods Phys. Res. A 246, 215-218 (1986).
10. M. E. Malinowski, P. Grunow, C. Steinhaus, W. M. Clift, and L. E. Klebanoff, "Use of molecular oxygen to reduce EUV-induced carbon contamination of optics," Proc. SPIE 4343, 347-356 (2001).
11. G. Kyriakou, D. J. Davis, R. B. Grant, D. J. Watson, A. Keen, M. S. Tikhov, and R. M. Lambert, "Electron impact-assisted carbon film growth oil Ru(0001): implications for next-generation EUV lithography," J. Phys. Chem. C 111, 4491-4494 (2007).
12. C. Tarrio and S. Grantham, "Synchrotron beamline for extreme-ultraviolet multilayer mirror endurance testing," Rev. Sci. Instrum. 76, 056101 (2005).
13. n, upon ionization by a 26.5 eV soft x-ray laser," J. Chem. Phys. 124, 224319 (2006).
14. m," J. Chem. Phys. 125, 154316 (2006).
15. m," J. Chem. Phys. 125, 154317 (2006).
16. F. Dong, S. Heinbuch, J. J. Rocca, and E. R. Bernstein, "Formation and distribution of neutral vanadium, niobium, and tantalum oxide clusters: single photon ionization at 26.5 eV," J. Chem. Phys. 125, 164318 (2006).
17. 2O)z," J. Chem. Phys. 126, 244301 (2007).
18. F. Dong, S. Heinbuch, Y. Xie, J. J. Rocca, Z. Wang, K. Deng, S. He, and E. R. Bernstein, "Experimental and theoretical study of the reactions between neutral vanadium oxide clusters and ethane, ethylene, and acetylene," J. Am. Chem. Soc. 130, 1932-1943 (2008).
19. S. Heinbucb, M. Grisham, D. Martz, and J. J. Rocca, "Demonstration of a desk-top size high repetition rate soft x-ray laser," Opt. Express 13, 4050-4055 (2005).
20. S. Heinbuch, M. Grisham, D. Martz, F. Dong, E. R. Bernstein, and J. J. Rocca, "Desk-top size high repetition rate 46.9 nm capillary discharge laser as photoionization source for photochemistry applications," Proc. SPIE 5919, 591907 (2005).
21. M. E. Geusic, M. D. Morse, S. C. O'Brien, and R. E. Smalley, "Surface reactions of metal clusters I: The fast flow cluster reactor," Rev. Sci. Instrum. 56, 2123-2130 (1985).
22. Y. Matsuda and E. R. Bernstein, "On the titanium oxide neutral cluster distribution in the gas phase: detection through 118nm single-photon and 193 nm multiphoton ionization," J. Phys. Chem. A 109, 314-319 (2005).
23. T. E. Madey, N. S. Faradzhev, B. V. Yakshinskiy, and N. V. Edwards, "Surface phenomena related to mirror degradation in extreme ultraviolet (EUV) lithography," Appl. Surf. Sci. 253, 1691-1708 (2006).
24. Z. Luo, H. Cai, X. Ren, J. Liu, W, Hong, and P. Zhang, "Hydrophilicity of titanium oxide coatings with the addition of silica," Mater. Sci. Eng., B 138, 151-156 (2007).
25. M. Ritala, M. Leskelä, L. Niinistö, T. Prohaska, G. Friedbacher, and M. Grasserbauer, "Development of crystallinity and morphology in hafnium dioxide thin films grown by atomic layer epitaxy," Thin Solid Films 250, 72-80 (1994).
26. M. Ritala and M. Leskelä, "Zirconium dioxide thin films deposited by ALE using zirconium tetrachloride as precursor," Appl. Surf. Sci. 75, 333-340 (1994).
27. 2 coatings on stainless steel," J. Non-Cryst. Solids 147/148, 813-819 (1992).