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Journal of Applied Physics

Volumn 104, Issue 5, 2008, Pages

Effect of in-plane shear strain on phase states and dielectric properties of epitaxial ferroelectric thin films

(3) Zembilgotov, A G a,b Bottger U a Waser, R a,c

a RWTH AACHEN UNIVERSITY (Germany)

b St Petersburg Institute of Trade and Economics (Russian Federation)

c FORSCHUNGSZENTRUM JÜLICH (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC PROPERTIES; EPITAXIAL FILMS; FERROELECTRIC DEVICES; FERROELECTRIC FILMS; FERROELECTRIC MATERIALS; FERROELECTRIC THIN FILMS; FERROELECTRICITY; MOLECULAR BEAM EPITAXY; STRAIN; THICK FILMS; THIN FILMS; TITANIUM OXIDES;

DIELECTRIC PERMITTIVITIES; DIRECTIONAL DEPENDENCE; EFFECT OF IN; EPITAXIAL FERROELECTRIC; FERROELECTRIC PHASE TRANSITIONS; FILM PLANES; IN-PLANE; PHASE FORMATIONS; PHASE STATES;

SHEAR STRAIN;

EID: 51849109396 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.2976347 Document Type: Article

Times cited : (16)

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