Epitaxial nature and anisotropic dielectric properties of (Pb,Sr) Ti O3 thin films on NdGa O3 substrates

Applied Physics Letters

Volumn 86, Issue 14, 2005, Pages 1-3

  Lin, Y ^a   Chen, X ^b   Liu, S W ^b   Chen, C L ^b   Lee, Jang Sik ^a   Li, Y ^a   Jia, Q X ^a   Bhalla, A ^c  

^a LOS ALAMOS NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF HOUSTON   (United States)

^c PENNSYLVANIA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COOLING RATES; DIELECTRIC MEASUREMENTS; ELECTRONIC DEVICES; ROOM TEMPERATURE;

ANISOTROPY; DIELECTRIC PROPERTIES; EPITAXIAL GROWTH; GROWTH (MATERIALS); SUBSTRATES; THIN FILMS; TITANIUM OXIDES; X RAY DIFFRACTION ANALYSIS;

NEODYMIUM COMPOUNDS;

EID: 17444375266     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1897078     Document Type: Article

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