Optical lithography modeling

Microlithography: Science and Technology, Second Edition

Volumn , Issue , 2007, Pages 97-147

  Mack, Chris A ^a  

^a NONE

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EID: 84902133403     PISSN: None     EISSN: None     Source Type: Book    
DOI: None     Document Type: Chapter

References (94)

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60. C.A. Mack. 1990. “Algorithm for optimizing stepper performance through image manipulation,” Proceedings of SPIE, 1264: 71-82.
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76. N. Thane, C. Mack, and S. Sethi. 1993. “Lithographic effects of metal reflectivity variations,” Proceedings of SPIE, 1926: 483-494.
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85. K. Schlicht, P. Scialdone, P. Spragg, S.G. Hansen, R.J. Hurditch, M.A. Toukhy, and D.J. Brzozowy. 1994. “Reliability of photospeed and related measures of resist performances,” Proceedings of SPIE, 2195: 624-639.
86. R.A. Cirelli, E.L. Raab, R.L. Kostelak, and S. Vaidya. 1994. “Optimizing numerical aperture and partial coherence to reduce proximity effect in deep-UV lithography,” Proceedings of SPIE, 2197: 429-439.
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88. P. Luehrmann and S. Wittekoek. 1994. “Practical 0.35 µm I-line lithography,” Proceedings of SPIE, 2197: 412-420.
89. V.A. Deshpande, K.L. Holland, and A. Hong. 1993. “Isolated-grouped linewidth bias on SVGL micrascan,” Proceedings of SPIE, 1927: 333-352.
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