Evanescent wave imaging in optical lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6154 I, Issue , 2006, Pages

  Smith, Bruce W ^a   Fan, Yongfa ^a   Zhou, Jianming ^a   Lafferty, Neal ^a   Estroff, Andrew ^a  

^a ROCHESTER INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

193nm immersion lithography; Evanescent wave lithography; Solid immersion lithography

Indexed keywords

193NM IMMERSION LITHOGRAPHY; EVANESCENT ENERGY BOUND; EVANESCENT WAVE LITHOGRAPHY; SOLID IMMERSION LITHOGRAPHY;

IMAGE COMMUNICATION SYSTEMS; IMAGE RECORDING; IMAGING SYSTEMS; MASKS; OPTICAL SYSTEMS; WAVE INTERFERENCE;

PHOTOLITHOGRAPHY;

EID: 33745794874     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.657322     Document Type: Conference Paper

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