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Volumn 6520, Issue PART 3, 2007, Pages
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Immersion lithography with numerical apertures above 2.0 using high index optical materials
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Author keywords
Hyper NA; Immersion lithography; Oblique angle; Total internal reflection
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Indexed keywords
IMMERSION LITHOGRAPHY;
LUTETIUM ALUMINUM GARNET;
OBLIQUE ANGLE;
PHOTORESIST BOUNDARY;
TOTAL INTERNAL REFLECTION;
IMAGE ANALYSIS;
LASERS;
NUMERICAL METHODS;
OPTIMIZATION;
REFLECTION;
REFRACTIVE INDEX;
PHOTOLITHOGRAPHY;
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EID: 35148885222
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.712429 Document Type: Conference Paper |
Times cited : (16)
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References (12)
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