Influence of N2 gas pressure and negative bias voltage on the microstructure and properties of Cr-Si-N films by a hybrid coating system

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 26, Issue 5, 2008, Pages 1188-1194

  Wang, Qimin ^a,b   Park, In Wook ^a   Kim, Kwangho ^a  

^a Pusan National University   (South Korea)

^b INSTITUTE OF METAL RESEARCH   (China)

Author keywords

[No Author keywords available]

Indexed keywords

BIAS VOLTAGE; CHEMICAL PROPERTIES; CHROMATE COATINGS; COMPUTER NETWORKS; ION IMPLANTATION; MAGNETRON SPUTTERING; METALLIC FILMS; MICROHARDNESS; MICROSTRUCTURE; PHASE STRUCTURE; PLATING; SILICON; STOICHIOMETRY;

NEGATIVE BIAS; SI-N FILMS;

MICROCRYSTALLINE SILICON;

EID: 50849099783     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2960558     Document Type: Article

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