Study on high-temperature oxidation behaviors of Cr-Si-N films

Surface and Coatings Technology

Volumn 200, Issue 24, 2006, Pages 6702-6705

  Kim, Jung Wook ^a   Kim, Kwang Ho ^a   Lee, D B ^b   Moore, J J ^c  

^a Pusan National University   (South Korea)

^b Sungkyunkwan University   (South Korea)

^c Department of Geology and Geological Engineering   (United States)

Author keywords

Chromium nitride; Coatings; Oxidation; Silicon effect

Indexed keywords

ACTIVATION ENERGY; AMORPHOUS SILICON; CHROMIUM COMPOUNDS; MAGNETRON SPUTTERING; OXIDATION RESISTANCE; REACTION KINETICS;

ARC ION PLATING; CHROMIUM NITRIDE; DC MAGNETRON SPUTTERING; SILICON EFFECT;

PROTECTIVE COATINGS;

ACTIVATION ENERGY; AMORPHOUS SILICON; CHROMIUM COMPOUNDS; MAGNETRON SPUTTERING; OXIDATION RESISTANCE; PROTECTIVE COATINGS; REACTION KINETICS;

EID: 33745027929     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.10.004     Document Type: Article

References (28)

1. Aubert A., Danroc J., Gaucher A., and Terrat J.P. Thin Solid Films 126 (1985) 61
2. Munz W.D., and Gobel J. Surf. Eng. 3 (1987) 47
3. Ichimura H., and Kawana A. J. Mater. Res. 9 (1994) 151
4. Mayrhofer P.H., Willmann H., and Mitterer C. Surf. Coat. Technol. 146-147 (2001) 222
5. Panjan P., Navinsek B., Cvelbar A., Zalar A., and Milosev I. Thin Solid Films 281-282 (1996) 298
6. Panjan P., Navinsek B., Cvelbar A., Zalar A., and Vlcek J. Surf. Coat. Technol. 98 (1998) 1497
7. Lee D.B., Kim M.H., Lee Y.C., and Kwon S.C. Surf. Coat. Technol. 141 (2001) 232
8. Hsieh J.H., Zhang W.H., Li C., and Sun C.Q. Surf. Coat. Technol. 146-147 (2001) 331
9. Lee D.B. Surf. Coat. Technol. 173 (2003) 81
10. Huber E., and Hofmann S. Surf. Coat. Technol. 68-69 (1994) 64
11. Vetter J., Lugscheider E., and Guerreiro S.S. Surf. Coat. Technol. 98 (1998) 1233
12. Hirai M., Saito H., Suzuki T., Suematsu H., Jiang W., and Yatsui K. Thin Solid Films 407 (2002) 122
13. Yamamoto K., Sato T., Takahara K., and Hanaguri K. Surf. Coat. Technol. 174-175 (2003) 620
14. Gannon P.E., Tripp C.T., Knospe A.K., Ramana C.V., Deibert M., Smith R.J., Gorokhovsky V.I., Shutthanandan V., and Gelles D. Surf. Coat. Technol. 188-189 (2004) 55
15. Brizuela M., Garcia-Luis A., Braceras I., Onate J.I., Sanchez-Lopez J.C., Martinez-Martinez D., Lopez-Cartes C., and Fernandez A. Surf. Coat. Technol. 192-197 (2005) 200
16. Rother B., and Kappl H. Surf. Coat. Technol. 96 (1997) 163
17. Zhou M., Nose M., and Nogi K. Surf. Coat. Technol. 183 (2004) 45
18. Schulz H., and Bergmann E. Surf. Coat. Technol. 50 (1991) 53
19. Cekada M., Panjan P., Macek M., and Smid P. Surf. Coat. Technol. 151-152 (2002) 31
20. Cekada M., Macek M., Merl D.K., and Panjan P. Thin Solid Films 433 (2003) 174
21. Cekada M., Panjan P., Navisek B., and Cvelbar F. Vacuum 52 (1999) 461
22. Hsieh J.H., Li C., Tan A.L.K., Poh C.K., and Tan N.J. Surf. Coat. Technol. 177-178 (2004) 299
23. Park J.H., Chung W.S., Cho Y.R., and Kim K.H. Surf. Coat. Technol. 188-189 (2004) 425
24. A. Thobor-Keck, F. Lapostolle, A.S. Dehlinger, D. Pilloud, J.F. Pierson, C. Coddet, Surf. Coat. Technol. (in press).
25. Kawana A., Ichimura H., and Mining J. Mater. Proc. Inst. Jpn. 108 (1992)
26. Otani Y., and Hofmann S. Thin Solid Films 287 (1996) 188
27. Lee D.B., Lee Y.C., and Kwon S.C. Surf. Coat. Technol. 141 (2001) 227
28. Hofmann S., and Jehn H.A. Werkst. Korros 41 (1990) 756