Effects of substrate bias and argon flux on the structure of titanium nitride films deposited by filtered cathodic arc plasma

Physica Status Solidi (A) Applications and Materials Science

Volumn 202, Issue 1, 2005, Pages 95-101

  Zhang, Y J ^a,b   Yan, P X ^b   Wu, Z G ^b   Zhang, W W ^b   Zhang, G A ^b   Liu, W M ^a   Xue, Q J ^a  

^a INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

^b LANZHOU UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL GRAIN SIZE; FILTERED CATHODIC ARC PLASMAS (FCAP) TECHNOLOGY; TITANIUM NITRIDE FILMS;

ARGON; CATHODES; CRYSTAL ORIENTATION; DEPOSITION; ELECTRON DIFFRACTION; GRAIN SIZE AND SHAPE; IMAGE ANALYSIS; NANOSTRUCTURED MATERIALS; PLASMA APPLICATIONS; SILICON; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

TITANIUM NITRIDE;

EID: 25444461106     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.200406902     Document Type: Article

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