Stress relaxation and optical characterization of TiO2 and SiO2 films grown by dual ion beam deposition

Thin Solid Films

Volumn 516, Issue 23, 2008, Pages 8604-8608

  Bundesmann, C ^a   Eichentopf, I M ^a   Mandl S ^a   Neumann, H ^a  

^a LEIBNIZ INSTITUTE OF SURFACE ENGINEERING IOM   (Germany)

Author keywords

Dual ion beam deposition; Ion bombardment; Optical properties; Silicon oxide; Stress; Titanium oxide

Indexed keywords

DUAL ION BEAM DEPOSITION; ION BOMBARDMENT; OPTICAL CHARACTERIZATIONS; OPTICAL PROPERTIES; SILICON OXIDE; STRESS; STRESS-RELAXATION; TITANIUM OXIDE;

EID: 50849086728     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.06.032     Document Type: Article

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