Oxidation of Ni(Pt)Si by molecular vs. atomic oxygen

Applied Surface Science

Volumn 254, Issue 22, 2008, Pages 7486-7493

  Manandhar, Sudha ^a   Copp, Brian ^a   Kelber, J A ^a  

^a UNIVERSITY OF NORTH TEXAS   (United States)

Author keywords

Atomic oxygen; Nickel silicide; Oxidation; Platinum; Silicate; XPS

Indexed keywords

ATOMS; MOLECULAR OXYGEN; NICKEL COMPOUNDS; OXIDATION; PASSIVATION; PLATINUM; SILICATES; SILICIDES; SILICON OXIDES; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMIC OXYGEN; NICKEL MONOSILICIDE; NICKEL SILICIDE; OVERLAYER THICKNESS; SILICATE FORMATION; SILICIDE FORMATION; SILICON OXIDATION; VACUUM CONDITION;

PLATINUM COMPOUNDS;

EID: 50549102489     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.06.007     Document Type: Article

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