Ferromagnetism and microstructure in Cr implanted p-type (100) silicon

Solid State Communications

Volumn 148, Issue 3-4, 2008, Pages 122-125

  Gao, L J ^a,b   Chow, L ^c   Vanfleet, R ^d   Jin, K ^a,b   Zhang, Z H ^a,b   Duan, X F ^a,b   Xu, B ^a,b   Zhu, B Y ^a,b   Cao, L X ^a,b   Qiu, X G ^a,b   Zhao, B R ^a,b  

^a INSTITUTE OF PHYSICS   (China)

^b INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

^c UNIVERSITY OF CENTRAL FLORIDA   (United States)

^d Brigham Young University   (United States)

Author keywords

A. Cr; B. Anneal; B. Ion implantation; D. Ferromagnetism

Indexed keywords

CHROMIUM; MAGNETIC PROPERTIES; MICROSTRUCTURE; NONMETALS; SILICON;

A. CR; B. ANNEAL; B. ION IMPLANTATION; D. FERROMAGNETISM; P-TYPE SI;

MICROCRYSTALLINE SILICON;

EID: 50449103681     PISSN: 00381098     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ssc.2008.07.043     Document Type: Article

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