Growth of Cr-doped TiO2 films in the rutile and anatase structures by oxygen plasma assisted molecular beam epitaxy

Thin Solid Films

Volumn 484, Issue 1-2, 2005, Pages 289-298

  Osterwalder, J ^b   Droubay, T ^a   Kaspar, T ^a   Williams, J ^a   Wang, C M ^a   Chambers, S A ^a  

^a PACIFIC NORTHWEST NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF ZURICH   (Switzerland)

Author keywords

Chromium; Magnetic properties and measurements; Molecular beam epitaxy; Titanium dioxide

Indexed keywords

ANISOTROPY; CHROMIUM; CRYSTAL LATTICES; FERROMAGNETISM; FILM GROWTH; MOLECULAR BEAM EPITAXY; PULSED LASER DEPOSITION; TITANIUM DIOXIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

MAGNETIC PROPERTIES AND MEASUREMENTS; MAGNETIC RESPONSE; RUTILE STRUCTURES; SPINTRONIC MATERIALS;

THIN FILMS;

EID: 19844382884     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.02.028     Document Type: Article

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