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Volumn , Issue , 2007, Pages

Backside IR photon emission microscopy (IR-PEM) observation in failure analysis of the packaged devices

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRONIC EQUIPMENT MANUFACTURE; ELECTRONICS PACKAGING; FAILURE ANALYSIS; LITHOGRAPHY; METALS; NONMETALS; PHOTONS; QUALITY ASSURANCE; RELIABILITY; SAFETY FACTOR; SILICON; SILICON WAFERS; TECHNOLOGY;

EID: 50249134159     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ICEPT.2007.4441539     Document Type: Conference Paper
Times cited : (4)

References (8)
  • 1
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    • Chen Zhaoyi, Fang Peiyuan and Wang Jiaji, "Study on the Micro-infrared Radiation of CMOS Devices and Defects", RESEARCH & PROGRESS OF SSE, Vol 26. No 4. (2006), pp. 461-465.
    • (2006) RESEARCH & PROGRESS OF SSE , vol.26 , Issue.4 , pp. 461-465
    • Chen, Z.1    Fang, P.2    Wang, J.3
  • 2
    • 0000994970 scopus 로고
    • Mechanism for reverse-biased breakdown radiation in p-n junctions
    • Shewchun J, Wei L Y. "Mechanism for reverse-biased breakdown radiation in p-n junctions", Solid-state Electron, Vol. 8, (1965), pp. 485-493.
    • (1965) Solid-state Electron , vol.8 , pp. 485-493
    • Shewchun, J.1    Wei, L.Y.2
  • 3
    • 0036685464 scopus 로고    scopus 로고
    • A comparative Analysis of Substrate Current Generation Mechanisms in Tunneling MOS Capacitors
    • Palestri P, Serra A D, Selmi L, et al. "A comparative Analysis of Substrate Current Generation Mechanisms in Tunneling MOS Capacitors", IEEE Trans Electron Devices, Vol. 48, No. 8, (2002), pp. 1427-1435.
    • (2002) IEEE Trans Electron Devices , vol.48 , Issue.8 , pp. 1427-1435
    • Palestri, P.1    Serra, A.D.2    Selmi, L.3
  • 4
    • 50249090328 scopus 로고    scopus 로고
    • New Applications of the Infrared Emission Microscopy to Wafer-level Backside andFlip-chip Package Analyses
    • Steve Hsiung, Kevan Tan and Joe Luo, "New Applications of the Infrared Emission Microscopy to Wafer-level Backside andFlip-chip Package Analyses", IRW final report, 2002, pp. 147-150.
    • (2002) IRW final report , pp. 147-150
    • Hsiung, S.1    Tan, K.2    Luo, J.3
  • 5
    • 14844310243 scopus 로고    scopus 로고
    • Backside Failure Analysis and Case Studies for Cu/Low k Technology
    • Taiwan
    • Agere Systems, "Backside Failure Analysis and Case Studies for Cu/Low k Technology", Proceedings of 11th IPFA 2004, Taiwan, 2004, pp.127-134.
    • (2004) Proceedings of 11th IPFA , pp. 127-134
    • Systems, A.1
  • 6
    • 50249144450 scopus 로고    scopus 로고
    • Application of Thermometric Sensors in Temperature Measurement
    • Xia Guijuan, Jiang Juyuan and Zhang Liangming, "Application of Thermometric Sensors in Temperature Measurement", .Infrared Technology Vol.18, No. 3 (1996), pp. 17-40.
    • (1996) Infrared Technology , vol.18 , Issue.3 , pp. 17-40
    • Xia, G.1    Jiang, J.2    Zhang, L.3
  • 7
    • 0033284103 scopus 로고    scopus 로고
    • Novel Backside Sample Preparation Processes for Advanced CMOS Integrated Circuits Failure Analysis
    • Singapore
    • Y. Y. Chew, et al, "Novel Backside Sample Preparation Processes for Advanced CMOS Integrated Circuits Failure Analysis", Proceedings of 7th IPFA 1999, Singapore, 1999, pp. 119-122.
    • (1999) Proceedings of 7th IPFA , pp. 119-122
    • Chew, Y.Y.1
  • 8
    • 0038443722 scopus 로고    scopus 로고
    • Huixian Wu and James Cargo, Characterization of reactive ion etching of silicon substrate for backside failure mode analysis, ISTFA 2002.
    • Huixian Wu and James Cargo, "Characterization of reactive ion etching of silicon substrate for backside failure mode analysis", ISTFA 2002.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.