Polytetrafluoroethylene processing characteristics using high-energy X-ray

Microsystem Technologies

Volumn 14, Issue 9-11, 2008, Pages 1567-1572

  Ukita, Yoshiaki ^a   Kanda, Kazuhiro ^a   Matsui, Shinji ^a   Kishihara, Mitsuyoshi ^b   Utsumi, Yuichi ^a  

^a UNIVERSITY OF HYOGO   (Japan)

^b OKAYAMA PREFECTURAL UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DESORPTION; NANOFLUIDICS; NICKEL; OPTICAL DESIGN; SURFACE STRUCTURE;

BUBBLE STRUCTURES; ENERGY REGIONS; HIGH ENERGIES; HIGH-ASPECT RATIO STRUCTURES; IRRADIATED SURFACES; MICRO-FLUIDIC; MICRO-PARTS; POLY TETRAFLUOROETHYLENE; PROCESSING CHARACTERISTICS; STENCIL MASKS; SURFACE STATES; VERTICAL FLUID FLOW;

ASPECT RATIO;

EID: 49949089269     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-008-0578-3     Document Type: Conference Paper

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