High aspect ratio micromachining by synchrotron radiation direct photo-etching

Microsystem Technologies

Volumn 4, Issue 3, 1998, Pages 135-138

  Katoh, T ^a   Zhang, Y ^a  

^a SUMITOMO HEAVY INDUSTRIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0005242651     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s005420050116     Document Type: Article

References (7)

1. Ehrfeld W; Bley P; Götz F; Mohr J; Münchenmeyer D; Schelb W; Baving HJ; Beets D: (1988) Progress in deep-etch synchrotron radiation lithography. J. Vac. Sci. Technol. B6: 178-182
2. El-Kholi A; Mohr J; Stransky R: (1994) Ultrasonic supported development of irradiated micro-structures. Microelec. Eng. 23: 219-222
3. Guckel H: (1996) Deep x-ray lithography for micromechanics and precision engineering, Rev. Sci. Instrum. 67: 3357
4. Hori T; Takayama T: (1995) 4th International Conference on Synchrotron Radiation sources and 2nd Asian Forum on Synchrotron Radiation (Proceedings): pp. 148-158, Pohang, POSTECH
5. Katoh T; Zhang Y: (1997) 6th International Conference on Synchrotron Radiation Instrumentation: to be published in J. Synchrotron Radiation
6. Küper S: (1989) Ablation mit UV-Laserlicht. Ph.D. Thesis: pp. 10-66, Göttingen University, Germany
7. Zhang Y; Katoh T: (1996) Synchrotron radiation micromachining of polymers to produce high aspect ratio microparts. Jpn. J. Appl. Phys. 35: L186-188