Mechanical characterization of chemical-vapor-deposited polycrystalline 3C silicon carbide thin films

Scripta Materialia

Volumn 59, Issue 9, 2008, Pages 995-998

  Nagappa, Sharvani ^a   Zupan, Marc ^a   Zorman, C A ^b  

^a Baltimore County   (United States)

^b Case Western Reserve University   (United States)

Author keywords

Chemical vapor deposition; Nanoindentation thin films; Silicon carbide

Indexed keywords

CHEMICAL PROPERTIES; ELASTICITY; ELECTROMECHANICAL DEVICES; MECHANICAL PROPERTIES; MEMS; MICROELECTROMECHANICAL DEVICES; MOLECULAR BEAM EPITAXY; NONMETALS; RESIDUAL STRESSES; SILICON; STRENGTH OF MATERIALS; STRESSES; THICK FILMS;

CHEMICAL VAPOR DEPOSITION; CHEMICAL-; ELASTIC PROPERTIES; FILM CURVATURE; MECHANICAL CHARACTERIZATIONS; MICRO-ELECTRO MECHANICAL SYSTEMS; NANOINDENTATION THIN FILMS; POLY-CRYSTALLINE; POLYCRYSTALLINE 3C-SIC; SILICON CARBIDE (SIC); SILICON CARBIDE THIN FILMS; YOUNG'S MODULUS;

SILICON CARBIDE;

EID: 49949084243     PISSN: 13596462     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.scriptamat.2008.07.010     Document Type: Article

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