On the formation of concentration profiles by low-energy ion bombardment and sputter depth profiling

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 170, Issue 1, 2000, Pages 53-61

  Zexian, Cao ^a   Oechsner, Hans ^a  

^a University of Koblenz Landau   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION; MATHEMATICAL MODELS; SPUTTERING; TRANSPORT PROPERTIES;

LOW ENERGY ION BOMBARDMENT; RADIATION ENHANCED DIFFUSION; SPUTTER DEPTH PROFILING;

ION BOMBARDMENT;

EID: 0034275318     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(00)00069-0     Document Type: Article

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